Compact lithium niobate plasmonic modulator.

Lithium niobate (LN)-based modulators offer superior modulation performances, including high-speed modulation, linearity, and temperature stability. However, these devices exhibit larger sizes due to the low light-matter interaction despite a significant electro-optic coefficient. In this work, we present a compact LN-based modulator using a plasmonic mode that confines the optical mode in a very narrow gap. By filling the gap with LN, the confinement factor in the LN is significantly enhanced. The proposed modulator provides an extremely small half-wave voltage-length product, VπL of 0.02 V/cm at an optical communication wavelength (λ = 1.55 µm). The proposed modulator scheme can be utilized in a wide range of optical communication devices that demand small footprints and a high-speed operation.

53 GBd PAM-4 fully-integrated silicon photonics transmitter with a hybrid flip-chip bonded laser.

We present a fully-integrated single-lane 53 GBd PAM-4 silicon photonics (SiPh) transmitter (Tx) with a flip-chip bonded laser diode (LD). The LD is butt-coupled to a Si edge coupler including a SiO2 suspended spot-size converter. The coupled power exceeds 10 dBm with a 1 dB allowable misalignment of 2.3 µm. The RF and eye performances of the Tx are evaluated. Extinction ratio >5 dB is obtained at 3.5 Vppd voltage swing. Aided by silicon capacitors, the Tx decouples parasitic inductances leading to remarkable improvements in the eye openings and transmitter dispersion eye closure quaternary by 1.16 dB. By implementing the fully-integrated Tx with driver packaging, we successfully demonstrate 106 Gb/s real-time operation satisfying KP4-FEC threshold at -5 dBm receiver sensitivity.

4 channel × 10 Gb/s bidirectional optical subassembly using silicon optical bench with precise passive optical alignment.

We demonstrate an advanced structure for optical interconnect consisting of 4 channel × 10 Gb/s bidirectional optical subassembly (BOSA) formed using silicon optical bench (SiOB) with tapered fiber guiding holes (TFGHs) for precise and passive optical alignment of vertical-cavity surface-emitting laser (VCSEL)-to-multi mode fiber (MMF) and MMF-to-photodiode (PD). The co-planar waveguide (CPW) transmission line (Tline) was formed on the backside of silicon substrate to reduce the insertion loss of electrical data signal. The 4 channel VCSEL and PD array are attached at the end of CPW Tline using a flip-chip bonder and solder pad. The 12-channel ribbon fiber is simply inserted into the TFGHs of SiOB and is passively aligned to the VCSEL and PD in which no additional coupling optics are required. The fabricated BOSA shows high coupling efficiency and good performance with the clearly open eye patterns and a very low bit error rate of less than 10-12 order at a data rate of 10 Gb/s with a PRBS pattern of 231-1.

Shape-controllable, bottom-up fabrication of microlens using oblique angle deposition.

This Letter reports a novel method for the simple fabrication of microlens arrays with a controlled shape and diameter on glass substrates. Multilayer stacks of silicon dioxide deposited by oblique angle deposition with hole mask patterns enable microlens formation. Precise control of mask height and distance, as well as oblique angle steps between deposited layers, supports the controllability of microlens geometry. The fabricated microlens arrays with designed geometry exhibit uniform optical properties.

Antireflective grassy surface on glass substrates with self-masked dry etching.

Although recently developed bio-inspired nanostructures exhibit superior optic performance, their practical applications are limited due to cost issues. We present highly transparent glasses with grassy surface fabricated with self-masked dry etch process. Simultaneously generated nanoclusters during reactive ion etch process with simple gas mixture (i.e., CF4/O2) enables lithography-free, one-step nanostructure fabrication. The resulting grassy surfaces, composed of tapered subwavelength structures, exhibit antireflective (AR) properties in 300 to 1,800-nm wavelength ranges as well as improved hydrophilicity for antifogging. Rigorous coupled-wave analysis calculation provides design guidelines for AR surface on glass substrates.

Size-dependent optical behavior of disordered nanostructures on glass substrates.

We demonstrate the distinctive optical properties of disordered nanostructures on glass substrates in accordance with changes in the average size of the nanostructures. Dissimilar sizes of nanostructures were fabricated by using different thicknesses of thermally dewetted Ag nanoparticles as etch masks. Unlike a flat glass substrate, the nanostructured glasses (NSGs) show a changed optical characteristic. By increasing the size of the nanostructures, the wavelength of the peak transmittance of about 99% gradually moved from 730 to 2000 nm. To clearly discern the effect of the different sizes of nanostructures, the normalized angle-dependent transmittance spectra of the NSGs were analyzed. Only if the size becomes relatively larger than the wavelength of the incident light are the transmittance spectra more strongly affected by the incident angle as well as by the relative size, rather than by the Fresnel reflection.